Influence of Annealing Temperature on the Structural, Optical Properties Dispersion Parameters of ZnO Thin Films and

Abstract

Zinc oxide ZnO thin films were prepared by chemical spray pyrolysis technique on glass substrates at (450℃) temperature. The prepared films were annealed at different temperatures (550and600 ℃) in air for 2h to study the effect of annealing on the structural and optical properties of ZnO thin films. As-deposited and annealed films were characterized by X-ray diffraction (XRD) and UV-Vis-NIR spectroscopy. X-ray diffraction patterns indicated that the ZnO films had a polycrystalline wurtzite structure and crystallite size increases with the increase of annealing temperature. The optical properties and dispersion parameters of ZnO films have been studied over a wavelength range(400-900)nm. The optical band gap, refractive index, extinction coefficient, single-oscillator energy, dispersion energy, moments of the optical spectra (M−1) and (M−3), average oscillator strength, average oscillator wavelength, high frequency dielectric constant, the ratio of carrier concentration to the effective mass N/m*, static dielectric constant and static refractive indices of the ZnO thin films were investigated. It was shown that the annealing temperature has significant effect on the properties of ZnO thin films.